Günther Bauer, A. A. Darhuber, C.M. Sotomayor Torres, P.D. Wang,
"Discretization effects in electron beam lithography studied by high resolution x-ray reciprocal space mapping"
, in Journal of Applied Physics, 1998, A.A. Darhuber, G. Bauer, P.D. Wang, C.M. Sotomayor Torres: "Discretization effects in electron beam lithography studied by high resolution x-ray reciprocal space mapping", Journal of Applied Physics, 83, 126 (1998), ISSN 0021-8979
Original Titel:
Discretization effects in electron beam lithography studied by high resolution x-ray reciprocal space mapping
Sprache des Titels:
Englisch
Journal:
Journal of Applied Physics
Erscheinungsjahr:
1998
Notiz zum Zitat:
A.A. Darhuber, G. Bauer, P.D. Wang, C.M. Sotomayor Torres: "Discretization effects in electron beam lithography studied by high resolution x-ray reciprocal space mapping", Journal of Applied Physics, 83, 126 (1998), ISSN 0021-8979
Publikationstyp:
Aufsatz / Paper in sonstiger referierter Fachzeitschrift
Forschungs-