Kevin Verma, Johannes Oder, Robert Wille,
"Simulating Industrial Electrophoretic Deposition on Distributed Memory Architectures"
: Euromicro Conference on Parallel, Distributed, and Network-Based Processing (PDP), 2019
Original Titel:
Simulating Industrial Electrophoretic Deposition on Distributed Memory Architectures
Sprache des Titels:
Englisch
Original Buchtitel:
Euromicro Conference on Parallel, Distributed, and Network-Based Processing (PDP)
Original Kurzfassung:
The application of coatings by employing Electrophoretic Deposition (EPD) is one of the key processes in automotive manufacturing. Here, car assemblies or entire car
bodies are dipped into a tank of liquid aimed for preventing
the object from future corrosion. However, this process is
highly non-trivial. In fact, it has to be ensured that no air
bubbles emerge during the dipping which may lead to an
incomplete coverage of the coating. Moreover, entrapped liquids
that remained after dipping out may lead to corrosion in the
consecutive manufacturing process. To detect such problems
in an early development stage, simulation methods based on
Computational Fluid Dynamics (CFD) are utilized. Additionally,
employing a dedicated volumetric decomposition method, this has
led to a tool chain ALSIM which allows to simulate the process
of EPD with significantly reduced complexity as compared to
standard CFD tools. However, despite these benefits, the method
still suffers from large execution times. In this work, we are
proposing a parallel scheme which allows for an execution on
distributed parallel memory architectures. To that end, dedicated
workload distribution and memory optimization methods are
presented, which eventually allow for an efficient simulation of
EPD coatings. Experimental evaluations based on industrial use
cases confirm the obtained benefits: While a serial simulation
required more than 8 days, the parallel method proposed in this
work allows to complete the simulation with 32 processes in less
than 15 hours.